The mask contains panthenol and Centella Asiatica extract to help soothe the skin, strengthen the skin barrier, and reduce sensitivity. A complex of Centella-derived actives (asiaticoside, madecassoside, asiatic acid, madecassic acid) supports skin regeneration and helps reduce skin reactivity. Birch sap provides intensive hydration, while allantoin helps soften the skin and relieve tightness.

The thin sheet adheres closely to the skin, ensuring even distribution of the essence and comfortable use even for very sensitive skin.

Key benefits

Soothes irritated and sensitive skin

Reduces redness and discomfort

Provides intensive hydration and maintains moisture balance

Strengthens the skin barrier

Improves skin comfort and softness

Key ingredients

Panthenol — soothes the skin and supports recovery and hydration

Centella Asiatica — helps calm irritation and strengthen the skin barrier

Asiaticoside, Madecassoside, Asiatic Acid, Madecassic Acid — support skin regeneration and reduce sensitivity

Birch sap (Betula Platyphylla Japonica Juice) — hydrates and softens the skin

Allantoin — relieves irritation and tightness

Skin type

Suitable for all skin types, especially sensitive, irritated, and redness-prone skin

How to use

Apply the mask to cleansed facial skin and adjust evenly

Leave on for 10–15 minutes

Remove the mask and gently pat the remaining essence into the skin until fully absorbed

Features

Gentle formula for sensitive skin

Suitable for regular use

No rinsing required

Volume: 35 g

Manufacturer: Dr. Althea

Country of origin: South Korea